• DocumentCode
    2247957
  • Title

    Three axis piezoresistive accelerometer using polysilicon layer

  • Author

    Kwon, Kijin ; Park, Sekwang

  • Author_Institution
    Dept. of Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea
  • Volume
    2
  • fYear
    1997
  • fDate
    16-19 Jun 1997
  • Firstpage
    1221
  • Abstract
    A three axis piezoresistive accelerometer was fabricated from a polysilicon layer using SDB (silicon direct bonding) technology and LPCVD. The variations of stress according to each direction were utilized to detect the three dimensional acceleration and eliminate cross-axis sensitivities. TCO (temperature coefficient of offset) shifts for X, Y and Z-axis Wheatstone bridge outputs were only about 0~0.07[%F.S.], 0.028~-0.016[%F.S.] and 0.007~-0.004[%F.S.] in the 25°C~160°C range, respectively. The sensitivities of the fabricated sensor for X, Y and Z-axis acceleration were about 0.06[mV/V·g], 0.06[mV/V·g] and 0.13[mV/V·g] at room temperature. The cross-axis sensitivity for X, Y and Z-axis acceleration was about 0.0093[mV/V·g], which corresponds to the elimination of cross-axis sensitivities as designed
  • Keywords
    accelerometers; bridge instruments; chemical vapour deposition; elemental semiconductors; internal stresses; micromachining; microsensors; piezoresistive devices; silicon; 25 to 160 C; FEM simulation; LPCVD; Si; Wheatstone bridge outputs; X-axis acceleration; Y-axis acceleration; Z-axis acceleration; bulk micromachining technology; cross-axis sensitivity elimination; polysilicon layer; silicon direct bonding technology; stress variations; temperature coefficient of offset shifts; three axis piezoresistive accelerometer; three dimensional acceleration detection; Acceleration; Accelerometers; Bridge circuits; Compressive stress; Electrical equipment industry; Micromachining; Piezoresistance; Silicon; Temperature sensors; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    0-7803-3829-4
  • Type

    conf

  • DOI
    10.1109/SENSOR.1997.635428
  • Filename
    635428