Title :
Development of low energy e-beam proximity projection lithography: LEEPL
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
LEEPL (Low Energy Electron Beam Proximity Projection Lithography) is proposed as a solution to the current cost issues in the semiconductor industry. Thanks to a simple tool configuration and small mask pattern area, LEEPL promises both tools and masks to be low cost. The author deals with mask issues, describes the proof of concept and the next step, and discusses the formation of an LEEPL consortium.
Keywords :
electron beam lithography; integrated circuit economics; masks; LEEPL consortium; cost issues; low energy electron beam proximity projection lithography; mask pattern area; proof of concept; semiconductor industry; tool configuration; Costs; Electronics industry; Fabrication; Home appliances; Lithography; Marketing and sales; Optical fiber communication; Pain; Production; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984057
