Progress and preliminary results on EB stepper

Author

Kawata, S. ; Hamashima, M. ; Miura, T. ; Suzuki, K. ; Okamoto, K. ; Yamaguchi, T.

Author_Institution

Precision Equip. Co., Nikon Corp., Saitama, Japan

fYear

2001

fDate

Oct. 31 2001-Nov. 2 2001

Firstpage

40

Lastpage

41

Abstract

As Next Generation Lithography (NGL) systems, several systems are proposed. EPL (Electron Beam Projection Lithography) system, which is one of NGL systems using electron beam (EB), is expected to be a most promising candidate, which has a high throughput (>20 wph of a 300 mm wafer) and a high resolution (<70 nm). Many studies on NGL systems have been reported but most of them were limited to basic scientific discussions on the research level. There are few discussions on technical issues on each system. Nikon has developed EPL system (EB Stepper) in collaboration with IBM. The development moves to the system evaluation phase. Discussions on EB Stepper must be technical rather than scientific. In this paper recent progress on EB Stepper will be discussed.

Keywords

electron beam lithography; EB Stepper; electron beam projection lithography; next generation lithography; Biomembranes; Electron beams; Electron optics; Electrooptic deflectors; High speed optical techniques; Lithography; Optical scattering; Page description languages; Research and development; System testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2001 International

Conference_Location

Shimane, Japan

Print_ISBN

4-89114-017-8

Type

conf

DOI

10.1109/IMNC.2001.984058

Filename

984058