• DocumentCode
    2248383
  • Title

    Ion clearing and photoelectron production in the 200 MeV SXLS ring

  • Author

    Halama, H. ; Bozoki, Eva

  • Author_Institution
    Brookhaven Nat. Lab., Upton, New York, NY, USA
  • fYear
    1991
  • fDate
    6-9 May 1991
  • Firstpage
    2313
  • Abstract
    The design of the SXLS (Superconducting X-ray Lithography Source) clearing system and its behavior are presented. In normal 200 MeV operation, clearing electrode current is dominated by photoelectrons. Clearing electrodes appear essentially only in several locations but not in the dipoles. The effect of clearing voltage on the tune and the beam profile is also discussed.<>
  • Keywords
    beam handling equipment; beam handling techniques; electron accelerators; synchrotrons; 200 MeV SXLS ring; Superconducting X-ray Lithography Source; beam profile; clearing electrode current; clearing system; clearing voltage; dipoles; ion clearing; photoelectron production; tune; Coaxial cables; Current measurement; Electrodes; Electrons; Laboratories; Production; Strips; Superconducting magnets; Synchrotron radiation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1991. Accelerator Science and Technology., Conference Record of the 1991 IEEE
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-0135-8
  • Type

    conf

  • DOI
    10.1109/PAC.1991.165264
  • Filename
    165264