DocumentCode
2248391
Title
A new inspection method for PSM on DUV inspection light source
Author
Isomura, I. ; Tsuchiya, H. ; Sugihara, S. ; Yamashita, K. ; Tabata, M.
Author_Institution
Adv. LSI Technol. Lab., Toshiba Corp., Kawasaki, Japan
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
64
Lastpage
65
Abstract
For the 130 nm generation, the Phase Shift Mask (PSM) is expected to be widely used. Moreover, demand for higher transmission PSM is increasing and a mask inspection system with high detection sensitivity for these masks is also required. In this paper, a new inspection method to improve defect detection sensitivity for a PSM in the DUV inspection system is discussed.
Keywords
automatic optical inspection; phase shifting masks; sensitivity; ultraviolet lithography; 130 nm; DUV inspection light source; PSM inspection system; acquisition image data; deep UV light source; defect detection sensitivity; high detection sensitivity; mask pattern; phase shift mask; reference image data; Chromium; Circuits; Filters; Glass; Image databases; Image edge detection; Inspection; Large scale integration; Light sources; Noise level;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984070
Filename
984070
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