Title :
Total-electron-yield x-ray standing-wave measurements of multilayer x-ray mirrors for the interface structure evaluation
Author :
Muramatsu, Y. ; Takenaka, L. ; Gullikson, E.M. ; Perera, R.C.C.
Author_Institution :
Japan Atomic Energy Res. Inst., Hyogo, Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
Summary form only given. Total-electron-yield (TEY) x-ray standing-wave spectra of multilayer x-ray mirrors by monitoring sample photocurrent are presented to obtain information on their interface structure. This simple TEY x-ray standing-wave method enables simultaneous spectral measurements of the x-ray standing-wave and Bragg reflection. Optical measurements of Bragg reflection and x-ray standing-waves were carried out by using the reflectometer installed in the beamline 6.3.2 at the Advanced Light Source (ALS). Results are reported for Mo/SiC/Si multilayer mirrors.
Keywords :
X-ray diffraction; X-ray optics; X-ray reflection; interface structure; mirrors; molybdenum; optical multilayers; silicon; silicon compounds; Advanced Light Source; Bragg reflection; Mo-SiC-Si; Mo/SiC/Si multilayer mirrors; interface structure; multilayer x-ray mirrors; photocurrent monitoring; reflectometer; simultaneous spectral measurements; total-electron-yield x-ray standing-wave measurements; Annealing; Atomic measurements; Laboratories; Light sources; Monitoring; Nonhomogeneous media; Optical reflection; Photoconductivity; Silicon carbide;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984072
