DocumentCode :
2250118
Title :
X-ray absorption fine structure measurement using a scanning capacitance microscope: trial for selective observation of trap centers in the /spl sim/nm region
Author :
Ishii, M.
Author_Institution :
JASRI, Hyogo, Japan
fYear :
2001
fDate :
Oct. 31 2001-Nov. 2 2001
Firstpage :
158
Lastpage :
159
Abstract :
In this paper, X-ray absorption fine structure (XAFS) measurements using a scanning capacitance microscope (SCM-XAFS method) are performed. Though the concept of this method is the same as the capacitance XAFS method, trap centers in selectable /spl sim/nm regions would be analyzed by using a scanning probe. Moreover, by controlling the bias voltage applied to the scanning probe, surface trap center selection is successfully achieved in the XAFS measurements.
Keywords :
X-ray absorption spectra; capacitance measurement; electron traps; scanning probe microscopy; X-ray absorption fine structure measurement; scanning capacitance microscope; trap centers; Capacitance measurement; Capacitance-voltage characteristics; Electromagnetic wave absorption; Electron traps; Ionization; Microscopy; Probes; Quantum capacitance; Schottky diodes; Semiconductor diodes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
Type :
conf
DOI :
10.1109/IMNC.2001.984138
Filename :
984138
Link To Document :
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