• DocumentCode
    2250118
  • Title

    X-ray absorption fine structure measurement using a scanning capacitance microscope: trial for selective observation of trap centers in the /spl sim/nm region

  • Author

    Ishii, M.

  • Author_Institution
    JASRI, Hyogo, Japan
  • fYear
    2001
  • fDate
    Oct. 31 2001-Nov. 2 2001
  • Firstpage
    158
  • Lastpage
    159
  • Abstract
    In this paper, X-ray absorption fine structure (XAFS) measurements using a scanning capacitance microscope (SCM-XAFS method) are performed. Though the concept of this method is the same as the capacitance XAFS method, trap centers in selectable /spl sim/nm regions would be analyzed by using a scanning probe. Moreover, by controlling the bias voltage applied to the scanning probe, surface trap center selection is successfully achieved in the XAFS measurements.
  • Keywords
    X-ray absorption spectra; capacitance measurement; electron traps; scanning probe microscopy; X-ray absorption fine structure measurement; scanning capacitance microscope; trap centers; Capacitance measurement; Capacitance-voltage characteristics; Electromagnetic wave absorption; Electron traps; Ionization; Microscopy; Probes; Quantum capacitance; Schottky diodes; Semiconductor diodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2001 International
  • Conference_Location
    Shimane, Japan
  • Print_ISBN
    4-89114-017-8
  • Type

    conf

  • DOI
    10.1109/IMNC.2001.984138
  • Filename
    984138