Title :
Dot-array resist patterning using scanning probe microscopy with a hybrid current-voltage control method
Author :
Ishibashi, M. ; Heike, S. ; Hashizume, T.
Author_Institution :
Adv. Res. Lab., Hitachi Ltd., Saitama, Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
We describe a dot-array patterning method using scanning probe lithography (SPL) with a hybrid current-voltage control system. The system is a combination of the conventional constant-voltage and constant-current control methods. Resist patterning results are presented.
Keywords :
atomic force microscopy; lithography; nanotechnology; resists; scanning electron microscopy; SEM micrograph; atomic force microscopy; dot-array resist patterning; field-emission current; hybrid current-voltage control method; nanometer-scale fabrication; raster-scan writing; scanning probe lithography; scanning probe microscopy; Control systems; Optical feedback; Optical films; Reproducibility of results; Resists; Scanning electron microscopy; Scanning probe microscopy; Substrates; Voltage control; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984140
