Fabrication of planar-type ferromagnet/nonmagnet/ferromagnet structures by using multi-angle deposition

Author

Kimura, T. ; Itagaki, Y. ; Wakaya, F. ; Gamo, K.

Author_Institution

Graduate Sch. of Eng. Sci., Osaka Univ., Japan

fYear

2001

fDate

Oct. 31 2001-Nov. 2 2001

Firstpage

172

Lastpage

173

Abstract

We propose two types of planar-spin-injection devices, and fabricate them by applying the three-layer-resist and multi-angle-deposition techniques. Using these structures, the detailed analysis of spin-diffusion phenomena and novel spin-related devices can be realized.

Keywords

cobalt; copper; electron beam lithography; ferromagnetic materials; giant magnetoresistance; magnetic multilayers; magnetisation reversal; magnetoresistive devices; spin dynamics; vacuum deposition; Ar ion milling process; Co-Cu-Co-Cu; GMR effects; electron-beam lithography; giant magnetoresistance; multi-angle deposition; oblique angle evaporation; planar-spin-injection devices; planar-type ferromagnet/nonmagnet/ferromagnet structures; spin-diffusion phenomena; spin-injection-induced magnetization reversal; spin-related devices; three-layer-resist technique; Fabrication; Giant magnetoresistance; Gold; Magnetic anisotropy; Magnetic devices; Magnetic domain walls; Magnetic recording; Perpendicular magnetic anisotropy; Tunneling magnetoresistance; Wire;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2001 International

Conference_Location

Shimane, Japan

Print_ISBN

4-89114-017-8

Type

conf

DOI

10.1109/IMNC.2001.984145

Filename

984145