Title :
Prototyping of field emitter array using focused ion and electron beams
Author :
Jarupoonphol, W. ; Ochiai, C. ; Takai, M. ; Hosono, A. ; Okuda, S.
Author_Institution :
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
Maskless prototyping of metal-gated field emitter arrays with pyramid-shape emitter was made using a dual beam system consisting of focused ion beam (FIB) and electron beam (EB) to develop emission current stability, emitter durability and high anode current.
Keywords :
electron beam applications; electron field emission; focused ion beam technology; vacuum microelectronics; dual beam system; electron beam; fabrication process; focused ion beam; maskless prototyping; metal-gated field emitter array; Cathode ray tubes; Design engineering; Electron beams; Field emitter arrays; Gold; Materials science and technology; Niobium; Prototypes; Voltage; Wet etching;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984151
