Holographic grating formation by wet etching in amorphous As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/ thin film

Amorphous As/sub 40/Ge/sub 10/Se/sub 15/S/sub 30/ thin films have been studied with the aim of identifying optimum etching conditions that can be used to produce holographic grating structure for use as diffractive optical elements. In this study, we have fabricated a holographic grating with the method of wet etching using 0.26N NaOH. The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. The formed grating profiles were observed by an atomic force microscope and showed that the expected grating profile could be achieved by controlling the etching time.