Title :
Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (II) relation between resist space resolution and space distribution of ionic species
Author :
Saeki, A. ; Kozawa, T. ; Yoshida, Y. ; Tagawa, S.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
The time dependent behavior of cation radical in n-dodecane was observed by pulse radiolysis, and analyzed by Monte Carlo simulation. By transforming the decay curve to the distribution distance between cation radical and electron, the time evolution of distribution was obtained. In nano-lithography of EB, since a large part of the reactions are initiated by ionization of resist base resin, the distribution of cation radical and electrons has an influence on resolution of patterning and line edge roughness.
Keywords :
Monte Carlo methods; electron resists; nanotechnology; radiolysis; Monte Carlo simulation; cation radical; decay curve; distribution distance; electron beam patterning; line edge roughness; lithographic process; microscopic region; n-dodecane; nanolithography; pulse radiolysis; radiation-induced reaction; resist base resin; resist space resolution; space distribution; time dependent behavior; time evolution; Electron beams; Electron microscopy; Ionization; Lithography; Optical materials; Probes; Resins; Resists; Scattering; Spontaneous emission;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984176
