Title :
Optimization of backside micromachined CMOS inductors for RF applications
Author :
Ozgur, Mehmet ; Zaghloul, Mona E. ; Gaitan, Michael
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., George Washington Univ., Washington, DC, USA
Abstract :
The quality factor of backside micromachined CMOS inductors is optimized for high frequency applications. Up to 90% improvement of the peak quality factor is predicted for 10 nH inductors according to the simulations over previously published results in this technology. Extensive tests will be performed for the fabricated inductors with an improved post-processing procedure
Keywords :
CMOS integrated circuits; Q-factor; inductors; micromachining; CMOS inductor; RF applications; backside micromachining; high frequency applications; optimization; quality factor; Application software; Biomembranes; CMOS technology; Inductors; Parasitic capacitance; Polyimides; Q factor; Radio frequency; Semiconductor device modeling; Stress;
Conference_Titel :
Circuits and Systems, 2000. Proceedings. ISCAS 2000 Geneva. The 2000 IEEE International Symposium on
Conference_Location :
Geneva
Print_ISBN :
0-7803-5482-6
DOI :
10.1109/ISCAS.2000.857394
