DocumentCode
2251414
Title
Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication
Author
Sugiyama, S.
Author_Institution
Res. Inst. for Micro Syst. Technol., Ritsumeikan Univ., Shiga, Japan
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
264
Lastpage
265
Abstract
High aspect ratio microstructure technology (HARMST) is an important technology in order to realize 3-D MEMS. Fine scale HARMST enables processing on a sub-micron scale. If this process is made practicable, application of MEMS can be extended to the optical wavelength region. We are studying two approaches of HARMST using synchrotron radiation microlithography and etching (SMILE) techniques.
Keywords
LIGA; etching; micromachining; micromechanical devices; 3-D MEMS; HARMST; LIGA; MEMS fabrication; PMMA microstructures; SMILE techniques; TIEGA; etching; high aspect ratio microstructure technology; micromachining; synchrotron radiation microlithography; teflon included etching galvanic forming; Etching; Fabrication; Lithography; Manufacturing industries; Manufacturing processes; Micromachining; Micromechanical devices; Microstructure; Optical surface waves; Synchrotron radiation;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984190
Filename
984190
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