Title :
Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication
Author_Institution :
Res. Inst. for Micro Syst. Technol., Ritsumeikan Univ., Shiga, Japan
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
High aspect ratio microstructure technology (HARMST) is an important technology in order to realize 3-D MEMS. Fine scale HARMST enables processing on a sub-micron scale. If this process is made practicable, application of MEMS can be extended to the optical wavelength region. We are studying two approaches of HARMST using synchrotron radiation microlithography and etching (SMILE) techniques.
Keywords :
LIGA; etching; micromachining; micromechanical devices; 3-D MEMS; HARMST; LIGA; MEMS fabrication; PMMA microstructures; SMILE techniques; TIEGA; etching; high aspect ratio microstructure technology; micromachining; synchrotron radiation microlithography; teflon included etching galvanic forming; Etching; Fabrication; Lithography; Manufacturing industries; Manufacturing processes; Micromachining; Micromechanical devices; Microstructure; Optical surface waves; Synchrotron radiation;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984190
