DocumentCode
2251602
Title
Adiabatic SRAM with a large margin of VT variation by controlling the cell-power-line and word-line voltage
Author
Nakata, S. ; Kusumoto, T. ; Miyama, M. ; Matsuda, Y.
Author_Institution
Microsyst. Integration Labs., NTT, Atsugi, Japan
fYear
2009
fDate
24-27 May 2009
Firstpage
393
Lastpage
396
Abstract
An adiabatic 1-kb SRAM circuit was designed, which enables gradual charging during writing and reading while maintaining a large VDD so that the problems of VT variation and electromigration in the nanocircuit can be resolved. In the writing mode, the voltage of the memory cell power line is reduced to ground gradually using a high-resistivity nMOSFET, and we turn off the nMOSFET so that the memory cell power line is set in a high-impedance state. Then, we can write data easily by inputting adiabatic signal from one bit line, while the other bit line is set to ground. For reading, a verifying operation is proposed for resolving the electromigration problem. The word line voltage is changed stepwise while the voltages of the bit lines are verified. The reading method enables a gradual current flow in the memory cell. We designed the cell layout and found that there is no area penalty. In addition, a new charge recycle circuit with tank capacitors is proposed.
Keywords
MOSFET; SRAM chips; nanoelectronics; adiabatic SRAM; cell-power-line; charge recycle circuit; electromigration; gradual charging; gradual current flow; high-resistivity nMOSFET; nanocircuit; word line voltage; word-line voltage; Current density; Electromigration; Energy consumption; MOSFET circuits; Random access memory; Recycling; Signal resolution; Voltage control; Wire; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems, 2009. ISCAS 2009. IEEE International Symposium on
Conference_Location
Taipei
Print_ISBN
978-1-4244-3827-3
Electronic_ISBN
978-1-4244-3828-0
Type
conf
DOI
10.1109/ISCAS.2009.5117768
Filename
5117768
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