• DocumentCode
    2251736
  • Title

    A simple and practical 157nm and 193 nm coherent light source

  • Author

    Zhang, Xiaoshi ; Liu, Hsia-Hua ; Muller, Dirk ; Backus, Sterling

  • Author_Institution
    Kapteyn-Murnane Labs. Inc., Boulder, CO
  • fYear
    2008
  • fDate
    4-9 May 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate a fully-coherent ultrafast UV light source at 193 and 157 nm using a cascaded four wave mixing technique in a hollow dielectric waveguide. We have obtained 200 nJ and 20 nJ per pulse energy at 193 nm and 157 nm respectively using pulses of 200 uJ pulse energy and 50 fs pulse width from a Ti:sapphire regenerative amplifier at 5 kHz. Our technique can easily be scaled to 100 kHz repetition rate for use in defect inspection for lithography development and many ultrafast spectroscopy experiments.
  • Keywords
    flaw detection; high-speed optical techniques; multiwave mixing; optical pulse generation; optical waveguides; sapphire; solid lasers; titanium; ultraviolet lithography; ultraviolet sources; ultraviolet spectroscopy; Al2O3:Ti; cascaded four wave mixing technique; defect inspection; energy 20 nJ; energy 200 muJ; energy 200 nJ; fully-coherent ultrafast UV light source; hollow dielectric waveguide; laser pulse energy; laser pulse width; laser repetition rate; lithography development; regenerative amplifier; time 50 fs; ultrafast spectroscopy experiments; wavelength 157 nm; wavelength 193 nm; Four-wave mixing; Gas lasers; Hollow waveguides; Light sources; Optical pulse generation; Optical waveguides; Pulse amplifiers; Space vector pulse width modulation; Spectroscopy; Waveguide lasers;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-859-9
  • Type

    conf

  • Filename
    4572117