Title :
Compact high power laser-plasma X-ray source for lithography
Author :
Gaeta, C.J. ; Rieger, H. ; Turcu, I.C.E. ; Forber, R.A. ; Campeau, S.M. ; Cassidy, K.L. ; Powers, M.F. ; Grygier, R.K. ; Maldonado, J.R. ; French, G. ; Naunguyan, J. ; Kelsy, C. ; Hark, P. ; Morris, J.H. ; Foster, R.M.
Author_Institution :
JMAR Res. Inc., San Diego, CA, USA
fDate :
Oct. 31 2001-Nov. 2 2001
Abstract :
Summary form only given. A compact laser produced plasma X-ray source generates 24 Watts average power of 1.1 nm X-rays in 2/spl pi/ steradians. The laser-plasma source is driven by a compact, diode-pumped, solid-state 300 Watt Nd:YAG laser system.
Keywords :
X-ray lithography; X-ray production; laser beam applications; 1.1 nm; 24 W; 300 W; PIN diode measurements; X-ray lithography; YAG:Nd; YAl5O12:Nd; average power; diode-pumped Nd:YAG laser system; incident total laser power; laser-plasma X-ray source; lithographic wavelength; Laser beams; Lithography; Optical amplifiers; Optical pulse generation; Optical pulses; Plasma x-ray sources; Power lasers; Pulse amplifiers; Solid lasers; X-ray lasers;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location :
Shimane, Japan
Print_ISBN :
4-89114-017-8
DOI :
10.1109/IMNC.2001.984204
