Title :
The influence of ambient temperature on femtosecond laser ablation of semiconductor and metal
Author :
Yahng, J.S. ; Nam, J.R. ; Yoon, T.O. ; Jeoung, S.C.
Author_Institution :
Div. of Adv. Technol., Korea Res. Inst. of Stand. & Sci., Daejeon
Abstract :
Ultrafast laser ablation of silicon and metal was investigated as a function of temperature. The ablation efficiency is slightly enhanced with an apparent decrease in ablation threshold and surface roughness at a high substrate temperature.
Keywords :
elemental semiconductors; high-speed optical techniques; laser ablation; silicon; stainless steel; surface roughness; ablation efficiency; ambient temperature; femtosecond laser ablation; surface roughness; Laser ablation; Optical surface waves; Pulsed laser deposition; Rough surfaces; Semiconductor lasers; Silicon; Surface emitting lasers; Surface morphology; Temperature; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-1173-3
Electronic_ISBN :
978-1-4244-1174-0
DOI :
10.1109/CLEOPR.2007.4391737
