DocumentCode
2252183
Title
Cold plasma generation by optical field ionization with hydrogen and helium gas mixture
Author
Kim, J. ; Ahn, J. ; Avitzour, Y. ; Kim, D. ; Suckewer, S.
Author_Institution
Korea Electrotechnol. Res. Inst., Changwon
fYear
2007
fDate
26-31 Aug. 2007
Firstpage
1
Lastpage
2
Abstract
To generate plasmas with low average electron energy, the optical field ionized plasmas with helium and hydrogen gas mixture was studied. To measure the average electron energy, the line intensity ratio was measured experimentally and calculated using an atomic kinetic model. The measured line intensity ratio indicates that the average electron energy is 3 eV for the case of 5 % helium and 95 % hydrogen gas mixture.
Keywords
photoionisation; plasma production by laser; H-He; atomic kinetic model; cold plasma generation; gas mixture; line intensity ratio; low average electron energy; optical field ionization; Atomic measurements; Electrons; Gas lasers; Helium; Hydrogen; Ionization; Plasma measurements; Plasma properties; Plasma x-ray sources; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location
Seoul
Print_ISBN
978-1-4244-1173-3
Electronic_ISBN
978-1-4244-1174-0
Type
conf
DOI
10.1109/CLEOPR.2007.4391740
Filename
4391740
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