• DocumentCode
    2252183
  • Title

    Cold plasma generation by optical field ionization with hydrogen and helium gas mixture

  • Author

    Kim, J. ; Ahn, J. ; Avitzour, Y. ; Kim, D. ; Suckewer, S.

  • Author_Institution
    Korea Electrotechnol. Res. Inst., Changwon
  • fYear
    2007
  • fDate
    26-31 Aug. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    To generate plasmas with low average electron energy, the optical field ionized plasmas with helium and hydrogen gas mixture was studied. To measure the average electron energy, the line intensity ratio was measured experimentally and calculated using an atomic kinetic model. The measured line intensity ratio indicates that the average electron energy is 3 eV for the case of 5 % helium and 95 % hydrogen gas mixture.
  • Keywords
    photoionisation; plasma production by laser; H-He; atomic kinetic model; cold plasma generation; gas mixture; line intensity ratio; low average electron energy; optical field ionization; Atomic measurements; Electrons; Gas lasers; Helium; Hydrogen; Ionization; Plasma measurements; Plasma properties; Plasma x-ray sources; X-ray lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1173-3
  • Electronic_ISBN
    978-1-4244-1174-0
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2007.4391740
  • Filename
    4391740