Local nucleation and lateral crystallisation of the silicide phases in CoSi2 buffer layer of YBCO/CoSi2/Si structure

The metallic cobalt disilicide (CoSi/sub 2/) with a lattice mismatch to Si of only 1.2% and l.5% to YBCO, a thermal expansion coefficient (9.4/spl middot/10/sup -6/ K/sup -1/ between YBCO and Si, low electrical resistivity and as a material for low-resistance ohmic contact to n- and p-type Si could be a very interesting component of multilayer structure based on YBCO and silicon. Phenomena of the local nucleation, lateral crystal growth and agglomeration of cobalt silicide phases have been investigated with emphasis an a possible cause of the surface roughness and pinholes of the silicide layer.