• DocumentCode
    2252305
  • Title

    ZnO as fast EUV scintillator for the next generation lithography

  • Author

    Tanaka, Mitsuru ; Nishikino, M. ; Nagashima, Kazuya ; Kimura, Tomohiro ; Furukawa, Yudai ; Murakami, H. ; Sarukura, N. ; Yamatani, H. ; Yoshikawac, A. ; Fukuda, Toshio

  • Author_Institution
    Adv. Photon Res. Center, Japan Atomic Energy Agency 8-1, Kyoto
  • fYear
    2007
  • fDate
    26-31 Aug. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Using Ni-like Ag extreme ultraviolet (EUV) laser operated at 13.9-nm, ZnO is shown to be the excellent scintillator in this wavelength region with sufficiently short response time of less than 3 nsec and prominent peak fluorescence originated form exciton at 380 nm.
  • Keywords
    II-VI semiconductors; excitons; fluorescence; scintillation; ultraviolet lithography; zinc compounds; EUV scintillator; ZnO; exciton; extreme ultraviolet laser; fluorescence; lithography; response time; wavelength 13.9 nm; wavelength 380 nm; Excitons; Fluorescence; Gas lasers; Laser excitation; Light sources; Lithography; Optical materials; Optical pulses; Ultraviolet sources; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1173-3
  • Electronic_ISBN
    978-1-4244-1174-0
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2007.4391745
  • Filename
    4391745
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2252305