Title :
3D nanoscale pattern formation in porous silicon
Author :
Chun, Ik Su ; Chow, Edmond K. ; Li, Xiuling
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL
Abstract :
A simple and effective processing technique for 3D nanoscale pattern formation in light emitting porous silicon is reported. The technique is based on metal assisted chemical etching and defined by the 2D nanoscale metal pattern.
Keywords :
elemental semiconductors; etching; nanopatterning; optical fabrication; optical materials; porous semiconductors; silicon; 3D nanoscale pattern formation; Si; light emitting porous silicon; metal assisted chemical etching; Atomic force microscopy; Chemicals; Etching; Optical sensors; Pattern formation; Scanning electron microscopy; Silicon; Stimulated emission; Surface morphology; Surface topography; 160.4236 Nanomaterials; 160.6000 Semiconductor materials;
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
