DocumentCode :
2253021
Title :
A comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry
Author :
Ning, Zhe ; Moyne, James R. ; Smith, Taber ; Boning, Duane ; Castillo, Enrique Del ; Yeh, Jinn-Yi ; Hurwitz, Arnon
Author_Institution :
Michigan Univ., MI, USA
fYear :
1996
fDate :
12-14 Nov 1996
Firstpage :
375
Lastpage :
381
Abstract :
A number of algorithms have been developed that are applicable to the run-to-run control of semiconductor manufacturing processes. The algorithm implementations include the linear approximation multivariate `Gradual Mode´ (GM) controller, a time-based extended GM (GMt), the Optimizing Adaptive Quality Controller (OAQC), and the Knowledge-based Interactive Run-to-run Controller (KIRC). Research and experimentation in process control in the industry to-date has revealed that no single algorithm is sufficiently robust to cover the entire domain of process control for most tools. Indeed the optimal control solution is a multi-branch approach to control that provides for the complementary utilization of a number of control algorithms, with the various algorithms utilized in sub-domains in which they are `best´ suited to provide control advice. Unfortunately this ideal solution cannot be realized because very little information is available on the suitable sub-domains of applicability of the various algorithms. This paper addresses this issue by providing a comparative analysis of a number of run-to-run control algorithms. Each algorithm is described so as to provide insight into its potential use in run-to-run control. A comparative study of the algorithms is then presented; comparison criteria include stability and ability to control in the face of noise and drift of linear and full-quadratic processes. Although the data presented does not represent an exhaustive comparison of the alternatives, it provides information that can be utilized to realize an effective multi-branch, multi-algorithm run-to-run control strategy
Keywords :
adaptive control; intelligent control; multivariable control systems; optimal control; process control; quality control; semiconductor device manufacture; Knowledge-based Interactive Run-to-run Controller; Optimizing Adaptive Quality Controller; drift; full-quadratic process; linear approximation multivariate Gradual Mode controller; linear process; multi-branch multi-algorithm strategy; noise; process control; run-to-run control algorithm; semiconductor manufacturing; stability; time-based extended GM; Adaptive control; Algorithm design and analysis; Approximation algorithms; Industrial control; Linear approximation; Manufacturing industries; Manufacturing processes; Optimal control; Process control; Programmable control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-3371-3
Type :
conf
DOI :
10.1109/ASMC.1996.558088
Filename :
558088
Link To Document :
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