DocumentCode
2253224
Title
Magnetic actuation and MOS-transistor sensing for CMOS-integrated resonators
Author
Lange, D. ; Hagleitner, C. ; Herzog, C. ; Brand, O. ; Baltes, H.
Author_Institution
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear
2002
fDate
24-24 Jan. 2002
Firstpage
304
Lastpage
307
Abstract
Presents a magnetic actuation scheme combined with a piezoresistive MOS-transistor sensing technique for CMOS-integrated resonators. It was developed for a cantilever resonator with on-chip amplifier, but is broadly applicable. The high efficiency of electromagnetic actuation significantly reduces the required operation power and allows for the use in portable devices. By use of stress-sensitive PMOS-transistors as active loads, the size of the piezoresistive Wheatstone bridge is significantly reduced. Thirdly, the post-processing sequence of the cantilever resonator has been optimized, so that only one photolithography step is necessary to release the whole mechanical structure. This facilitates the fabrication, increases yield and, thus, reduces fabrication cost.
Keywords
bridge instruments; microactuators; micromachining; microsensors; photolithography; piezoelectric transducers; piezoresistive devices; CMOS-integrated resonators; cantilever resonator; efficiency; fabrication cost; magnetic actuation scheme; mechanical structure; on-chip amplifier; operation power; photolithography step; piezoresistive MOS-transistor sensing technique; piezoresistive Wheatstone bridge; post-processing sequence; stress-sensitive PMOS-transistors; yield; Bridge circuits; Dielectrics; Fabrication; Magnetic fields; Piezoresistance; Resistors; Resonance; Stress; Thermal resistance; Vibrations;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location
Las Vegas, NV, USA
ISSN
1084-6999
Print_ISBN
0-7803-7185-2
Type
conf
DOI
10.1109/MEMSYS.2002.984263
Filename
984263
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