Title : 
Magnetic actuation and MOS-transistor sensing for CMOS-integrated resonators
         
        
            Author : 
Lange, D. ; Hagleitner, C. ; Herzog, C. ; Brand, O. ; Baltes, H.
         
        
            Author_Institution : 
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
         
        
        
        
        
        
            Abstract : 
Presents a magnetic actuation scheme combined with a piezoresistive MOS-transistor sensing technique for CMOS-integrated resonators. It was developed for a cantilever resonator with on-chip amplifier, but is broadly applicable. The high efficiency of electromagnetic actuation significantly reduces the required operation power and allows for the use in portable devices. By use of stress-sensitive PMOS-transistors as active loads, the size of the piezoresistive Wheatstone bridge is significantly reduced. Thirdly, the post-processing sequence of the cantilever resonator has been optimized, so that only one photolithography step is necessary to release the whole mechanical structure. This facilitates the fabrication, increases yield and, thus, reduces fabrication cost.
         
        
            Keywords : 
bridge instruments; microactuators; micromachining; microsensors; photolithography; piezoelectric transducers; piezoresistive devices; CMOS-integrated resonators; cantilever resonator; efficiency; fabrication cost; magnetic actuation scheme; mechanical structure; on-chip amplifier; operation power; photolithography step; piezoresistive MOS-transistor sensing technique; piezoresistive Wheatstone bridge; post-processing sequence; stress-sensitive PMOS-transistors; yield; Bridge circuits; Dielectrics; Fabrication; Magnetic fields; Piezoresistance; Resistors; Resonance; Stress; Thermal resistance; Vibrations;
         
        
        
        
            Conference_Titel : 
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
         
        
            Conference_Location : 
Las Vegas, NV, USA
         
        
        
            Print_ISBN : 
0-7803-7185-2
         
        
        
            DOI : 
10.1109/MEMSYS.2002.984263