Title :
Zirconium diboride low resistance layers
Author :
Andreeva, A.F. ; Statsenko, V.M. ; Klotchkov, L.A.
Author_Institution :
Inst. of Problems in Mater. Sci., Acad. of Sci., Kiev, Ukraine
Abstract :
The ion-plasma sputtering method, as we see it, is perspective for the zirconium diboride thin films production. The literature sources on the zirconium diboride thin films growth characteristics are sparse. The goal of this paper is to investigate the possibility of the zirconium diboride thin films production with the magnetron sputtering method and to investigate its structure and physical properties.
Keywords :
electrical resistivity; metallic thin films; sputtered coatings; zirconium compounds; ZrB/sub 2/; ion-plasma sputtering; magnetron sputtering; resistance; structure; thin film growth; zirconium diboride; Annealing; Chemicals; Circuit stability; Electric resistance; Sputtering; Temperature; Thermal stability; Thin film circuits; Transistors; Zirconium;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1997.621129
