CMOS MEMS - present and future

Author

Baltes, H. ; Brand, O. ; Hierlemann, A. ; Lange, D. ; Hagleitner, C.

Author_Institution

Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland

fYear

2002

fDate

24-24 Jan. 2002

Firstpage

459

Lastpage

466

Abstract

The paper reviews the state-of-the-art in the field of CMOS-based microelectromechanical systems (MEMS). The different CMOS MEMS fabrication approaches, pre-CMOS, intermediate-CMOS, and post-CMOS, are summarized and examples are given. Two microsystems fabricated with post-CMOS micromachining are presented, namely a mass-sensitive chemical sensor for detection of organic volatiles in air and a 10-cantilever force sensor array for application in scanning probe microscopy. The paper finishes with a look into the future, discussing key challenges and future application fields for CMOS MEMS.

Keywords

CMOS integrated circuits; force sensors; gas sensors; micromachining; micromechanical devices; microsensors; scanning probe microscopy; CMOS MEMS technology; cantilever force sensor array; mass-sensitive chemical sensor; micromachining; microsystem fabrication; organic volatile detection; scanning probe microscopy; CMOS process; CMOS technology; Chemical sensors; Chemical technology; Fabrication; Laboratories; Microelectromechanical systems; Micromachining; Micromechanical devices; Sensor arrays;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on

Conference_Location

Las Vegas, NV, USA

ISSN

1084-6999

Print_ISBN

0-7803-7185-2

Type

conf

DOI

10.1109/MEMSYS.2002.984302

Filename

984302