Title :
Photo-patternable gelatin as protection layers in surface micromachinings
Author :
Lung-Jieh Yang ; Wei-Zhi Lin ; Tze-Jung Yao ; Yu-Chong Tai
Author_Institution :
Dept. of Mech. Eng., Tamkang Univ., Tamsui, Taiwan
Abstract :
This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
Keywords :
gelatin; micromachining; photoresists; protective coatings; Parylene MEMS technology; low-temperature photopatternable gelatin technology; photoresist; protection layer; strengthening layer; surface micromachining; Chemical technology; Coatings; Fabrication; Food technology; Mechanical engineering; Micromachining; Micromechanical devices; Protection; Substrates; Temperature;
Conference_Titel :
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7185-2
DOI :
10.1109/MEMSYS.2002.984304
