Title :
CMOS integrated infrared sensor
Author :
Chang, David T. ; Chen, David M. ; Lin, Felice H. ; Kaiser, William J. ; Stafsudd, Oscar M.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Abstract :
CMOS integrated microsensors (CIMS) technology has been developed that combines bulk micromachining, pyroelectric materials and a commercial CMOS process to provide an integrated infrared sensor. This sensor system is based on a new sol-gel derived thin film fabricated on thin silicon micro electromechanical structure. The sensor has a peak responsivity of 2.33 V/W and a thermal time constant of 300 ms
Keywords :
CMOS integrated circuits; infrared detectors; micromachining; microsensors; pyroelectric detectors; sol-gel processing; 300 ms; CMOS integrated microsensors; bulk micromachining; integrated infrared sensor; microelectromechanical structure; peak responsivity; pyroelectric materials; sol-gel derived thin film; thermal time constant; CMOS process; CMOS technology; Computer integrated manufacturing; Infrared sensors; Micromachining; Microsensors; Pyroelectricity; Semiconductor thin films; Sensor systems; Thin film sensors;
Conference_Titel :
Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-3829-4
DOI :
10.1109/SENSOR.1997.635464
