Title :
Microlens fabrication by the modified LIGA process
Author :
Sung-Keun Lee ; Kwang-Cheol Lee ; Lee, S.S.
Author_Institution :
Dept. of Mech. Eng., Pohang Univ. of Sci. & Technol., South Korea
Abstract :
A microlens or microlenses array has been fabricated by a novel fabrication technology which is based upon a deep X-ray exposure and a thermal treatment of a resist, usually PMMA. The fabrication technology is very simple and produces the microlenses array as well as the microlens which has good surface roughness less than I nm. Molecular weight and glass transition temperature of PMMA is reduced when it is exposed to the deep X-ray. The microlens is produced through the effect of surface tension and reflow by applying the thermal treatment on the irradiated PMMA. A configuration of the microlens is determined by parameters such as absorbed X-ray dose on PMMA, heating temperature, and heating time in the thermal treatment. Diameters of the produced microlens range from 30 /spl mu/m to 1500 /spl mu/m and their heights vary between 10 /spl mu/m and 25 /spl mu/m.
Keywords :
LIGA; X-ray lithography; annealing; microlenses; optical fabrication; resists; surface topography; 10 to 25 micron; 30 to 1500 micron; PMMA; absorbed X-ray dose; deep X-ray exposure; diameter 30 /spl mu/m to 1500 /spl mu/m; glass transition temperature; heating temperature; heating time; heights 10 /spl mu/m and 25 /spl mu/m; microlens; molecular weight; thermal treatment; Fabrication; Heat treatment; Lenses; Microoptics; Resists; Rough surfaces; Surface roughness; Surface treatment; Temperature; Thermal resistance;
Conference_Titel :
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7185-2
DOI :
10.1109/MEMSYS.2002.984323