• DocumentCode
    2254933
  • Title

    All-dielectric micromachined calorimeter for high-resolution microwave power measurement

  • Author

    Jander, A. ; Moreland, J. ; Kabos, P.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Boulder, CO, USA
  • fYear
    2002
  • fDate
    24-24 Jan. 2002
  • Firstpage
    635
  • Lastpage
    640
  • Abstract
    We have developed a micromachined bimaterial cantilever with a thin-film ferromagnetic resonance (FMR) sensor to probe rf fields near microwave devices. A patterned permalloy film deposited at the tip of the cantilever serves as the localized FMR probe. Power absorption at the tip, under FMR conditions, results in a proportional bending of the bimaterial cantilever. The deflection of the cantilever is measured with an optical lever. The small dimensions of the probe (20 /spl mu/m /spl times/ 20 /spl mu/m /spl times/ 0.05 /spl mu/m) allows for measurements of rf magnetic fields near microwave devices with 20 /spl mu/m resolution and minimal intrusion. The sensor is constructed of low-stress silicon nitride and low-temperature-deposited silicon oxide. The use of dielectric materials in the cantilever beam minimizes the background signal produced by eddy-current heating of the cantilever. Using this scanning FMR probe we have measured vector-component-resolved microwave field distributions near a 500 /spl mu/m wide stripline resonator driven at 9.15 GHz.
  • Keywords
    Permalloy; calorimeters; ferromagnetic resonance; magnetic field measurement; microsensors; microwave measurement; silicon compounds; strip line resonators; 0.05 micron; 20 micron; 500 micron; 9.15 GHz; Si/sub 3/N/sub 4/-SiO/sub 2/; all-dielectric micromachined calorimeter; background signal; cantilever deflection; cantilever eddy-current heating; high-resolution microwave power measurement; localized FMR probe; low-stress Si/sub 3/N/sub 4/; low-temperature-deposited SiO/sub 2/; micromachined bimaterial cantilever; optical lever; patterned permalloy film; power absorption; proportional bending; rf field probing; rf magnetic field measurement; scanning FMR probe; stripline resonator; thin-film ferromagnetic resonance sensor; vector-component-resolved microwave field distributions; Dielectric measurements; Electromagnetic heating; Magnetic field measurement; Magnetic resonance; Microwave devices; Microwave measurements; Optical films; Optical resonators; Probes; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7185-2
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2002.984351
  • Filename
    984351