• DocumentCode
    2254982
  • Title

    Reducing silicon-substrate parasitics of on-chip transformers

  • Author

    Hongrui Jiang ; Zhihong Li ; Tien, N.C.

  • Author_Institution
    Berkeley Sensor & Actuator Center, California Univ., Berkeley, CA, USA
  • fYear
    2002
  • fDate
    24-24 Jan. 2002
  • Firstpage
    649
  • Lastpage
    652
  • Abstract
    Three-terminal transformers have been fabricated on 20-/spl mu/m-deep silicon-oxide blocks formed in the silicon substrate. The thick isolation blocks drastically reduced the parasitics between the devices and the silicon substrate underneath. The quality factors and the self-resonant frequencies were thus increased by more than 100% and 70%, respectively. Such oxide blocks also greatly reduce the cross talk between adjacent devices by as much as 15 dB.
  • Keywords
    elemental semiconductors; isolation technology; micromechanical devices; semiconductor technology; silicon; silicon compounds; 15 dB; 20 micron; MEMS process module; RF circuits; Si substrate; crosstalk 15dB; quality factors; self-resonant frequencies; thick isolation blocks; three-terminal transformers; wireless communication; Couplings; Eddy currents; Energy loss; Etching; Frequency; Parasitic capacitance; Q factor; Silicon; Spirals; Transformers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7185-2
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2002.984354
  • Filename
    984354