• DocumentCode
    2255417
  • Title

    Enhancing double-patterning detailed routing with lazy coloring and within-path conflict avoidance

  • Author

    Gao, Xin ; Macchiarulo, Luca

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Hawaii at Manoa, Honolulu, HI, USA
  • fYear
    2010
  • fDate
    8-12 March 2010
  • Firstpage
    1279
  • Lastpage
    1284
  • Abstract
    Double patterning technology (DPT) is emerging as the dominant technology to achieve the 32-nm node and beyond. Two challenges faced by DPT are layout decomposition and overlay error. To handle the challenges, some effort has been made to consider DPT during detailed routing. In this paper, we propose two enhancing techniques for DPT-friendly detailed routing: lazy color decision and last conflict segment recording. Experiments show that our techniques are able to reduce the number of stitches by 15~20% with 4% increase in running time.
  • Keywords
    lithography; double-patterning detailed routing; layout decomposition; lazy color decision; segment recording; size 32 nm; within-path conflict avoidance; Algorithm design and analysis; Electronic design automation and methodology; Error correction; Interference; Lithography; Manufacturing; Partitioning algorithms; Phase detection; Printing; Routing; Detailed Routing; Double Pattering Technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
  • Conference_Location
    Dresden
  • ISSN
    1530-1591
  • Print_ISBN
    978-1-4244-7054-9
  • Type

    conf

  • DOI
    10.1109/DATE.2010.5457003
  • Filename
    5457003