Title :
Enhancing double-patterning detailed routing with lazy coloring and within-path conflict avoidance
Author :
Gao, Xin ; Macchiarulo, Luca
Author_Institution :
Dept. of Electr. Eng., Univ. of Hawaii at Manoa, Honolulu, HI, USA
Abstract :
Double patterning technology (DPT) is emerging as the dominant technology to achieve the 32-nm node and beyond. Two challenges faced by DPT are layout decomposition and overlay error. To handle the challenges, some effort has been made to consider DPT during detailed routing. In this paper, we propose two enhancing techniques for DPT-friendly detailed routing: lazy color decision and last conflict segment recording. Experiments show that our techniques are able to reduce the number of stitches by 15~20% with 4% increase in running time.
Keywords :
lithography; double-patterning detailed routing; layout decomposition; lazy color decision; segment recording; size 32 nm; within-path conflict avoidance; Algorithm design and analysis; Electronic design automation and methodology; Error correction; Interference; Lithography; Manufacturing; Partitioning algorithms; Phase detection; Printing; Routing; Detailed Routing; Double Pattering Technology;
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
Conference_Location :
Dresden
Print_ISBN :
978-1-4244-7054-9
DOI :
10.1109/DATE.2010.5457003