DocumentCode :
2256292
Title :
Faster CMOS inverter switching obtained with channel engineered asymmetrical halo implanted MOSFETs
Author :
Akturk, Akin ; Goldsman, Neil ; Metze, George
Author_Institution :
Dept. of Electr. & Comput. Eng., Maryland Univ., College Park, MD, USA
fYear :
2001
fDate :
2001
Firstpage :
118
Lastpage :
121
Abstract :
Asymmetrically doped CMOS inverters have been designed. A mixed mode device/circuit simulator has been developed to analyze the new designs. Results show that the asymmetrically doped devices can give rise to inverter switching speeds which are several times faster than those composed of conventional CMOS. Such an increase should translate directly to similar increases in computer processor speeds. The asymmetrical designs could be achieved by changing only a few steps in an already existing CMOS process, and could therefore be used to extend the life of an existing technology, and thus save from having to construct prohibitively expensive fabrication facilities
Keywords :
CMOS integrated circuits; circuit simulation; digital simulation; integrated circuit modelling; invertors; semiconductor device models; switching circuits; CMOS inverter; CMOS process technology; Si; asymmetrical design; channel engineered asymmetrical halo implanted MOSFETs; computer processor speed; inverter switching speed; mixed mode device/circuit simulator; Analytical models; Circuit noise; Circuit simulation; Doping; Implants; Inverters; Kirchhoff´s Law; MOSFETs; Transient analysis; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2001 International
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-7432-0
Type :
conf
DOI :
10.1109/ISDRS.2001.984453
Filename :
984453
Link To Document :
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