• DocumentCode
    2256759
  • Title

    Avalanche breakdown of 4H-SiC diodes with edge terminated by a 2° positive bevel

  • Author

    Yan, Feng ; Qin, Chao ; Zhao, Jian H.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    216
  • Lastpage
    219
  • Abstract
    The authors present attempts toward obtaining impact ionization rates of both holes and electrons. Diodes terminated by a 2° positive bevel have been fabricated with the anode area ranging from 10 4 μm2 to 3x105 μm2. The breakdown voltages were measured. The multiplication factors of electrons and holes have been calculated based on the photocurrent measured at 230 nm and 370 nm. The impact ionization rates of holes and electrons are calculated from the multiplication results
  • Keywords
    avalanche breakdown; avalanche diodes; avalanche photodiodes; impact ionisation; photoconductivity; silicon compounds; wide band gap semiconductors; 2° positive bevel edge termination; 230 nm; 370 nm; 4H-SiC diodes; SiC; anode area; avalanche breakdown; breakdown voltage; electron impact ionization rate; hole impact ionization rate; multiplication factors; photocurrent; Anodes; Avalanche breakdown; Diodes; Doping; Electric breakdown; Etching; Fasteners; Impact ionization; Silicon carbide; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2001 International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-7432-0
  • Type

    conf

  • DOI
    10.1109/ISDRS.2001.984479
  • Filename
    984479