DocumentCode
2256759
Title
Avalanche breakdown of 4H-SiC diodes with edge terminated by a 2° positive bevel
Author
Yan, Feng ; Qin, Chao ; Zhao, Jian H.
Author_Institution
Dept. of Electr. & Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
fYear
2001
fDate
2001
Firstpage
216
Lastpage
219
Abstract
The authors present attempts toward obtaining impact ionization rates of both holes and electrons. Diodes terminated by a 2° positive bevel have been fabricated with the anode area ranging from 10 4 μm2 to 3x105 μm2. The breakdown voltages were measured. The multiplication factors of electrons and holes have been calculated based on the photocurrent measured at 230 nm and 370 nm. The impact ionization rates of holes and electrons are calculated from the multiplication results
Keywords
avalanche breakdown; avalanche diodes; avalanche photodiodes; impact ionisation; photoconductivity; silicon compounds; wide band gap semiconductors; 2° positive bevel edge termination; 230 nm; 370 nm; 4H-SiC diodes; SiC; anode area; avalanche breakdown; breakdown voltage; electron impact ionization rate; hole impact ionization rate; multiplication factors; photocurrent; Anodes; Avalanche breakdown; Diodes; Doping; Electric breakdown; Etching; Fasteners; Impact ionization; Silicon carbide; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2001 International
Conference_Location
Washington, DC
Print_ISBN
0-7803-7432-0
Type
conf
DOI
10.1109/ISDRS.2001.984479
Filename
984479
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