Formation of silicon nanoclusters in silicate matrix using an electron beam

A high power electron beam was used for the formation of silicon nanoclusters in different silicate matrices (bulk glass, ZrSiO₄ , silica gel). The evolution of silicon clusters in the silicate matrix was studied using local cathodoluminescence (CL) and measurement of the volt-ampere characteristic of the modified areas. Three stages in the formation of silicon clusters were observed in the silicon oxides and zircon. The initial stage is the appearance of radiation defects, the second stage is the formation of small silicon clusters (2-3 nm), and the last is the appearance of large silicon clusters and an "island" of crystal silicon. In silica gel, only the formation of small clusters is possible under the same conditions