Title :
Post-placement temperature reduction techniques
Author :
Liu, Wei ; Nannarelli, Alberto ; Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo
Author_Institution :
Tech. Univ. of Denmark, Lyngby, Denmark
Abstract :
With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit´s area.
Keywords :
integrated circuit design; temperature; thermal management (packaging); STM technology; hotspots; post placement temperature reduction technique; size 65 nm; temperature gradient; thermal aware design flow; whitespace; Circuit testing; Delay; Energy management; Integrated circuit interconnections; Integrated circuit technology; Switching circuits; Temperature; Thermal management; Timing; Uncertainty;
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
Conference_Location :
Dresden
Print_ISBN :
978-1-4244-7054-9
DOI :
10.1109/DATE.2010.5457127