DocumentCode :
2257779
Title :
Post-placement temperature reduction techniques
Author :
Liu, Wei ; Nannarelli, Alberto ; Calimera, Andrea ; Macii, Enrico ; Poncino, Massimo
Author_Institution :
Tech. Univ. of Denmark, Lyngby, Denmark
fYear :
2010
fDate :
8-12 March 2010
Firstpage :
634
Lastpage :
637
Abstract :
With technology scaled to deep submicron era, temperature and temperature gradient have emerged as important design criteria. We propose two post-placement techniques to reduce peak temperature by intelligently allocating whitespace in the hotspots. Both methods are fully compliant with commercial technologies, and can be easily integrated with state-of-the-art thermal-aware design flow. Experiments in a set of tests on circuits implemented in STM 65nm technologies show that our methods achieve better peak temperature reduction than directly increasing circuit´s area.
Keywords :
integrated circuit design; temperature; thermal management (packaging); STM technology; hotspots; post placement temperature reduction technique; size 65 nm; temperature gradient; thermal aware design flow; whitespace; Circuit testing; Delay; Energy management; Integrated circuit interconnections; Integrated circuit technology; Switching circuits; Temperature; Thermal management; Timing; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
Conference_Location :
Dresden
ISSN :
1530-1591
Print_ISBN :
978-1-4244-7054-9
Type :
conf
DOI :
10.1109/DATE.2010.5457127
Filename :
5457127
Link To Document :
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