Title :
Gas phase study of the reactivity of optical coating materials with hydrocarbons using a compact EUV laser
Author :
Heinbuch, S. ; Dong, F. ; Rocca, J.J. ; Bernstein, E.R.
Author_Institution :
Depts. of Chem. & Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO
Abstract :
We have conducted single photon ionization mass spectroscopy studies of the chemical reactivity of Sim/Tim/Hfm/Zrm/RumOn, metal oxide nanoclusters. The results are relevant to the carbon contamination of capping layers in extreme ultraviolet (EUV) reflective coatings.
Keywords :
chemical reactions; hafnium compounds; mass spectroscopic chemical analysis; optical films; reflectivity; ruthenium compounds; silicon compounds; titanium compounds; zirconium compounds; SiO-TiO-HfO-ZrO-RuO; capping layers; carbon contamination; chemical reactivity; compact EUV laser; extreme ultraviolet reflective coatings; gas phase; metal oxide nanoclusters; optical coating materials; single photon ionization mass spectroscopy; Chemical lasers; Coatings; Conducting materials; Gas lasers; Hafnium; Hydrocarbons; Ionization; Mass spectroscopy; Optical materials; Ultraviolet sources; 140.7240 UV, XUV, and X-ray lasers; 300.6400 Spectroscopy, molecular beam; 340.7480 X-rays, soft xrays, extreme ultraviolet (EUV);
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
