Gas phase study of the reactivity of optical coating materials with hydrocarbons using a compact EUV laser

Author

Heinbuch, S. ; Dong, F. ; Rocca, J.J. ; Bernstein, E.R.

Author_Institution

Depts. of Chem. & Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO

fYear

2008

fDate

4-9 May 2008

Firstpage

1

Lastpage

2

Abstract

We have conducted single photon ionization mass spectroscopy studies of the chemical reactivity of Si_m/Ti_m/Hf_m/Zr_m/Ru_mO_n, metal oxide nanoclusters. The results are relevant to the carbon contamination of capping layers in extreme ultraviolet (EUV) reflective coatings.

Keywords

chemical reactions; hafnium compounds; mass spectroscopic chemical analysis; optical films; reflectivity; ruthenium compounds; silicon compounds; titanium compounds; zirconium compounds; SiO-TiO-HfO-ZrO-RuO; capping layers; carbon contamination; chemical reactivity; compact EUV laser; extreme ultraviolet reflective coatings; gas phase; metal oxide nanoclusters; optical coating materials; single photon ionization mass spectroscopy; Chemical lasers; Coatings; Conducting materials; Gas lasers; Hafnium; Hydrocarbons; Ionization; Mass spectroscopy; Optical materials; Ultraviolet sources; 140.7240 UV, XUV, and X-ray lasers; 300.6400 Spectroscopy, molecular beam; 340.7480 X-rays, soft xrays, extreme ultraviolet (EUV);

fLanguage

English

Publisher

iet

Conference_Titel

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Conference_Location

San Jose, CA

Print_ISBN

978-1-55752-859-9

Type

conf

Filename

4572402