Title :
IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings
Abstract :
The following topics were covered: computer integrated manufacturing; maximizing equipment productivity; inline inspection for defect reduction; methods for cycle time reduction; process improvement methodologies; international perspective; manufacturing cost reduction techniques; advanced processing-thin films/photo; defect reduction in equipment and processes; advanced processing-etch; advanced metrology; advanced process control; yield enhancement techniques; human resources and partnering issues
Keywords :
computer integrated manufacturing; costing; etching; human resource management; inspection; integrated circuit manufacture; manufacturing data processing; process control; production; production engineering computing; semiconductor device manufacture; CIM; IC manufacture; chip production; computer integrated manufacturing; cycle time reduction; defect reduction; equipment productivity; etching processes; human resources; inline inspection; manufacturing cost reduction techniques; metrology; process control; process improvement methodologies; semiconductor manufacturing; thin film processing; wafer fabrication; yield enhancement techniques;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996
Conference_Location :
Cambridge, MA, USA
Print_ISBN :
0-7803-3371-3
DOI :
10.1109/ASMC.1996.558123
