DocumentCode
2259390
Title
4H- and 6H-SiC vertical static induction transistor with p-n junction as a gate
Author
Sankin, V.I. ; Shkrebiy, P.P.
Author_Institution
A.F. Ioffe Phys. Tech. Inst., St. Petersburg, Russia
fYear
2001
fDate
2001
Firstpage
579
Lastpage
582
Abstract
Silicon carbide has attracted considerable interest as a material for high power, high frequency devices. The unique properties such as high thermal conductivity, anomaly large breakdown fields and others provide the potential for development of effective devices particularly in the microwave region. The development of a microwave SiC power transistor with vertical design is of great interest. Such a transistor has been formed with Schottky gate contact. We use a p-n junction instead of the Schottky gate contact and present its I-V characteristics
Keywords
microwave power transistors; p-n junctions; semiconductor device breakdown; semiconductor device measurement; silicon compounds; wide band gap semiconductors; 4H-SiC; 6H-SiC; I-V characteristic; SiC; breakdown field; gate p-n junction; high frequency device; high power device; high thermal conductivity; microwave SiC power transistor; microwave region; silicon carbide; vertical static induction transistor; Conducting materials; Electric breakdown; Frequency; Microwave FETs; Microwave devices; Microwave transistors; P-n junctions; Power transistors; Silicon carbide; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2001 International
Conference_Location
Washington, DC
Print_ISBN
0-7803-7432-0
Type
conf
DOI
10.1109/ISDRS.2001.984584
Filename
984584
Link To Document