• DocumentCode
    2259390
  • Title

    4H- and 6H-SiC vertical static induction transistor with p-n junction as a gate

  • Author

    Sankin, V.I. ; Shkrebiy, P.P.

  • Author_Institution
    A.F. Ioffe Phys. Tech. Inst., St. Petersburg, Russia
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    579
  • Lastpage
    582
  • Abstract
    Silicon carbide has attracted considerable interest as a material for high power, high frequency devices. The unique properties such as high thermal conductivity, anomaly large breakdown fields and others provide the potential for development of effective devices particularly in the microwave region. The development of a microwave SiC power transistor with vertical design is of great interest. Such a transistor has been formed with Schottky gate contact. We use a p-n junction instead of the Schottky gate contact and present its I-V characteristics
  • Keywords
    microwave power transistors; p-n junctions; semiconductor device breakdown; semiconductor device measurement; silicon compounds; wide band gap semiconductors; 4H-SiC; 6H-SiC; I-V characteristic; SiC; breakdown field; gate p-n junction; high frequency device; high power device; high thermal conductivity; microwave SiC power transistor; microwave region; silicon carbide; vertical static induction transistor; Conducting materials; Electric breakdown; Frequency; Microwave FETs; Microwave devices; Microwave transistors; P-n junctions; Power transistors; Silicon carbide; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2001 International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-7432-0
  • Type

    conf

  • DOI
    10.1109/ISDRS.2001.984584
  • Filename
    984584