DocumentCode
2259563
Title
Comparison of symmetric and asymmetric double gate MOSFETs: tunneling currents and hot electrons
Author
Spedo, S. ; Fiegna, C.
Author_Institution
Dept. of Eng., Ferrara Univ., Italy
fYear
2001
fDate
2001
Firstpage
601
Lastpage
604
Abstract
In this work the symmetric and asymmetric Double-Gate MOSFETs are compared in terms of gate tunneling current and carrier heating. The results of device simulation show that a larger gate tunneling current is obtained in the case of the asymmetric gate structure, compared to symmetric one. Moreover, the analysis of hot carrier effects indicates that the symmetric structure is characterized by slightly larger carrier heating. The results of this paper provide useful insights and indications about the implications on reliability of different available technological options for the realization of Double-Gate MOSFETs
Keywords
MOSFET; hot carriers; semiconductor device models; tunnelling; asymmetric structure; device simulation; double gate MOSFET; hot electrons; symmetric structure; tunneling current; CMOS technology; Doping; Electrodes; Electrons; Heating; Hot carrier effects; MOSFETs; Performance analysis; Silicon; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2001 International
Conference_Location
Washington, DC
Print_ISBN
0-7803-7432-0
Type
conf
DOI
10.1109/ISDRS.2001.984591
Filename
984591
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