• DocumentCode
    2259563
  • Title

    Comparison of symmetric and asymmetric double gate MOSFETs: tunneling currents and hot electrons

  • Author

    Spedo, S. ; Fiegna, C.

  • Author_Institution
    Dept. of Eng., Ferrara Univ., Italy
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    601
  • Lastpage
    604
  • Abstract
    In this work the symmetric and asymmetric Double-Gate MOSFETs are compared in terms of gate tunneling current and carrier heating. The results of device simulation show that a larger gate tunneling current is obtained in the case of the asymmetric gate structure, compared to symmetric one. Moreover, the analysis of hot carrier effects indicates that the symmetric structure is characterized by slightly larger carrier heating. The results of this paper provide useful insights and indications about the implications on reliability of different available technological options for the realization of Double-Gate MOSFETs
  • Keywords
    MOSFET; hot carriers; semiconductor device models; tunnelling; asymmetric structure; device simulation; double gate MOSFET; hot electrons; symmetric structure; tunneling current; CMOS technology; Doping; Electrodes; Electrons; Heating; Hot carrier effects; MOSFETs; Performance analysis; Silicon; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2001 International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-7432-0
  • Type

    conf

  • DOI
    10.1109/ISDRS.2001.984591
  • Filename
    984591