DocumentCode :
2260621
Title :
The effect of FIB technology on design methodology
Author :
Wang, Moon Yee ; Lee, Sean X. ; Pei, Shiyan
Author_Institution :
Silicon Graphics Comput. Syst., Mountain View, CA, USA
fYear :
1993
fDate :
16-18 Aug 1993
Firstpage :
725
Abstract :
The applications of focused-ion-beam (FIB) in integrated circuit (IC) modifications are discussed. The capabilities and characteristics of this technology along with the practical examples are provided in this paper
Keywords :
focused ion beam technology; integrated circuit design; integrated circuit noise; integrated circuit reliability; integrated circuit technology; FIB technology; IC modifications; design methodology; focused-ion-beam technology; integrated circuit fabrication; Apertures; Application specific integrated circuits; Debugging; Design methodology; Integrated circuit technology; Ion beams; Lenses; Needles; Production; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 1993., Proceedings of the 36th Midwest Symposium on
Conference_Location :
Detroit, MI
Print_ISBN :
0-7803-1760-2
Type :
conf
DOI :
10.1109/MWSCAS.1993.342945
Filename :
342945
Link To Document :
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