• DocumentCode
    2260621
  • Title

    The effect of FIB technology on design methodology

  • Author

    Wang, Moon Yee ; Lee, Sean X. ; Pei, Shiyan

  • Author_Institution
    Silicon Graphics Comput. Syst., Mountain View, CA, USA
  • fYear
    1993
  • fDate
    16-18 Aug 1993
  • Firstpage
    725
  • Abstract
    The applications of focused-ion-beam (FIB) in integrated circuit (IC) modifications are discussed. The capabilities and characteristics of this technology along with the practical examples are provided in this paper
  • Keywords
    focused ion beam technology; integrated circuit design; integrated circuit noise; integrated circuit reliability; integrated circuit technology; FIB technology; IC modifications; design methodology; focused-ion-beam technology; integrated circuit fabrication; Apertures; Application specific integrated circuits; Debugging; Design methodology; Integrated circuit technology; Ion beams; Lenses; Needles; Production; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 1993., Proceedings of the 36th Midwest Symposium on
  • Conference_Location
    Detroit, MI
  • Print_ISBN
    0-7803-1760-2
  • Type

    conf

  • DOI
    10.1109/MWSCAS.1993.342945
  • Filename
    342945
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2260621