Title :
Training many-parameter shape-from-shading models using a surface database
Author :
Khan, Nazar ; Tran, Lam ; Tappen, Marshall
Author_Institution :
Univ. of Central Florida, Orlando, FL, USA
fDate :
Sept. 27 2009-Oct. 4 2009
Abstract :
Shape-from-shading (SFS) methods tend to rely on models with few parameters because these parameters need to be hand-tuned. This limits the number of different cues that the SFS problem can exploit. In this paper, we show how machine learning can be applied to an SFS model with a large number of parameters. Our system learns a set of weighting parameters that use the intensity of each pixel in the image to gauge the importance of that pixel in the shape reconstruction process. We show empirically that this leads to a significant increase in the accuracy of the recovered surfaces. Our learning approach is novel in that the parameters are optimized with respect to actual surface output by the system. In the first, offline phase, a hemisphere is rendered using a known illumination direction. The isophotes in the resulting reflectance map are then modelled using Gaussian mixtures to obtain a parametric representation of the isophotes. This Gaussian parameterization is then used in the second phase to learn intensity-based weights using a database of 3D shapes. The weights can also be optimized for a particular input image.
Keywords :
Gaussian processes; image reconstruction; image resolution; learning (artificial intelligence); reflectivity; shape recognition; visual databases; 3D shapes; Gaussian parameterization; SFS problem; illumination direction; intensity-based weights; isophotes; machine learning; many-parameter shape-from-shading models; offline phase; pixel; reflectance map; shape reconstruction; surface database; weighting parameter set; Computer vision; Conferences; Databases; Image reconstruction; Machine learning; Partial differential equations; Pixel; Shape; Surface reconstruction; Training data;
Conference_Titel :
Computer Vision Workshops (ICCV Workshops), 2009 IEEE 12th International Conference on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4244-4442-7
Electronic_ISBN :
978-1-4244-4441-0
DOI :
10.1109/ICCVW.2009.5457444