Title :
Inspection recipe management based on captured defect distribution
Author :
Ono, M. ; Asakawa, Yuki ; Sato, Takao
Author_Institution :
Manuf. Syst. 2nd Dept., Hitachi Ltd., Yokohama, Japan
fDate :
30 Sept.-2 Oct. 2003
Abstract :
In-line defect inspection tools need a recipe for defect detection at each inspection step. Conventional recipe criteria do not adequately determine the quality of the recipe, so a new recipe evaluation measure called OAR (Overlooked Area Ratio) was developed to quantify the defect distribution of the inspection results. The OAR method was applied to actual inspection data, and the results verified the validity of the method.
Keywords :
flaw detection; inspection; semiconductor device manufacture; system-on-chip; captured defect distribution; defect detection; inspection recipe management; line defect inspection tools; overlooked area ratio; recipe evaluation; Area measurement; Circuits; Data analysis; Inspection; Manufacturing processes; Manufacturing systems; Performance analysis; Semiconductor device measurement; System-on-a-chip; Yield estimation;
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
Print_ISBN :
0-7803-7894-6
DOI :
10.1109/ISSM.2003.1243251