DocumentCode
2265198
Title
Advanced ultraviolet-light-absorption silk fabricated by decorating with TiO2 nano-particles
Author
Fei Wu ; Huang, Xin-tang ; Li, Min-Hua ; Ding, Rui-min
Author_Institution
Inst. of Nanosci. & Nanotechnol., Huazhong Normal Univ., Wuhan, China
fYear
2010
fDate
Nov. 29 2010-Dec. 2 2010
Firstpage
742
Lastpage
745
Abstract
Ultraviolet radiation is always threatening our people´s health, while the traditional clothes have not met the demands of resisting UV radiation. In this paper, we fabricated a new kind of silk coating with TiO2 nanoparticles. The obtained sample was characterized by SEM and XRD. Experimental UV spectra results show that this new kind of textile has an absorption peak at around 340 nm with magnitude of over 65%. In this kind of textile, a majority of absorbed Ultraviolet radiation is contributed to the band-gap transition and surface Rayleigh scattering of the TiO2. The strong combination in the interlayer of TiO2 and silk is dependent on their electrostatic interaction. This silk can be utilized as the material of clothes and sunshades, even in the military application of stealth serve.
Keywords
Rayleigh scattering; X-ray diffraction; absorption; decorative coatings; nanofabrication; nanoparticles; protective clothing; scanning electron microscopy; textiles; ultraviolet spectra; SEM; TiO2; UV radiation; XRD; bandgap transition; electrostatic interaction; nanoparticles; silk coating; surface Rayleigh scattering; textile; ultraviolet radiation; ultraviolet-light-absorption silk fabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Antennas Propagation and EM Theory (ISAPE), 2010 9th International Symposium on
Conference_Location
Guangzhou
Print_ISBN
978-1-4244-6906-2
Type
conf
DOI
10.1109/ISAPE.2010.5696574
Filename
5696574
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