• DocumentCode
    2265293
  • Title

    Electrothermal behavior of highly-symmetric three-finger bipolar transistors

  • Author

    La Spina, L. ; d´Alessandro, V. ; Russo, S. ; Rinaldi, N. ; Nanver, L.K.

  • Author_Institution
    Lab. of Electron. Components, Technol., & Mater. (ECTM), Delft Univ. of Technol., Delft, Netherlands
  • fYear
    2009
  • fDate
    12-14 Oct. 2009
  • Firstpage
    21
  • Lastpage
    24
  • Abstract
    Design guidelines are established for improving the electrothermal stability of multifinger bipolar transistors as a result of experiments and simulations conducted on three-finger silicon-on-glass BJTs with selfheating and mutual thermal resistances varying over a large range of values, depending on silicon area, presence of heatspreaders, isolation and distance between the fingers. A rotational-symmetric topography that ensures a high level of symmetry between the individual emitters is proposed to achieve a significant enlargement of the safe operating area as compared to the more conventional parallel-finger designs.
  • Keywords
    bipolar transistors; stability; thermal resistance; BJT; bipolar transistors; design guidelines; electrothermal behavior; electrothermal stability; rotational-symmetric topography; silicon-on-glass; thermal resistance; Bipolar transistors; Electrothermal effects; Fingers; Guidelines; Resistance heating; Silicon; Surfaces; Thermal conductivity; Thermal resistance; Thermal stability; Aluminum nitride (AlN); bipolar junction transistors (BJTs); electrothermal effects; heatspreaders; multifinger device; safe operating area; selfheating; silicon-on-glass (SOG); thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
  • Conference_Location
    Capri
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4244-4894-4
  • Electronic_ISBN
    1088-9299
  • Type

    conf

  • DOI
    10.1109/BIPOL.2009.5314145
  • Filename
    5314145