DocumentCode
2265351
Title
Analytical model for the forward current of Al implanted 4H-SiC p-i-n diodes in a wide range of temperatures
Author
Pezzimenti, F. ; Albanese, L. Freda ; Bellone, S. ; Corte, Francesco
Author_Institution
DIMET, Mediterranea Univ. of Reggio Calabria, Reggio Calabria, Italy
fYear
2009
fDate
12-14 Oct. 2009
Firstpage
214
Lastpage
217
Abstract
The forward J-V characteristics of 4H-SiC p-i-n diodes are investigated in a wide range of currents and temperatures by means of an analytical model which describes in detail the role of the various physical parameters, such as bandgap narrowing effect, incomplete doping activation and doping-dependent mobility. In order to analyze the influence of the SiC properties at different injection regimes, the total diode current is expressed in terms of the minority current contributions in the various device regions. The accuracy of the model is verified by comparisons with numerical simulations and experimental data reported in the literature. The analysis shows that the proposed model can turn useful for a better understanding of the device behavior and for implementation in circuit simulators.
Keywords
ion implantation; p-i-n diodes; Al implanted 4H-SiC p-i-n diodes; SiC properties; analytical model; bandgap narrowing effect; doping-dependent mobility; forward J-V characteristics; forward current; incomplete doping activation; total diode current; Analytical models; Circuit simulation; Numerical simulation; P-i-n diodes; Photonic band gap; Semiconductor diodes; Silicon carbide; Spontaneous emission; Temperature distribution; Voltage; Silicon carbide; current density; power semiconductor diodes; semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
Conference_Location
Capri
ISSN
1088-9299
Print_ISBN
978-1-4244-4894-4
Electronic_ISBN
1088-9299
Type
conf
DOI
10.1109/BIPOL.2009.5314147
Filename
5314147
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