• DocumentCode
    2265443
  • Title

    Defect control strategies and defect-yield-correlations in consideration of defect capture rate

  • Author

    Tochtrop, T.

  • Author_Institution
    Philips Semicond. GmbH, Boeblingen, Germany
  • fYear
    2003
  • fDate
    30 Sept.-2 Oct. 2003
  • Firstpage
    239
  • Lastpage
    242
  • Abstract
    The influence of defect capture rate on defect line control strategies and defect-yield-correlation models is discussed. A theoretical model, describing the influence of measurement tool parameters in connection with chip design parameters, reveals that a considerable amount of defects cannot be detected generally. Practical examples support this experience. Consequences of these capture rate variations with respect to defect control concepts and defect-yield-correlations, under special consideration of product diversity within a production line, are deduced. Finally different concepts to handle these capture rate issues are roughly discussed.
  • Keywords
    electronic products; integrated circuit design; product design; quality control; chip design; defect capture rate; defect control; defect yield correlations; electronic products; integrated circuit design; product design; quality control; Area measurement; Chip scale packaging; Light scattering; Portfolios; Position measurement; Product design; Production; Semiconductor device measurement; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2003 IEEE International Symposium on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7894-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2003.1243273
  • Filename
    1243273