Title :
An effective method of characterization poly gate CD variation and its impact on product performance and yield
Author :
Xiao-Yu Li ; Feng Wang ; Wang, Michael ; Horng Nan Chern
Author_Institution :
Xilinx, San Jose, CA, USA
fDate :
30 Sept.-2 Oct. 2003
Abstract :
Poly gate CD variation has been increasingly affecting product performance and yield in advanced process technology. Here a BIST pattern based poly gate CD measurement (tilo) methodology is introduced in FPGA product. FPGA circuit is programmed into small local BIST pattern (tilo) and its delay is accurately reflecting local poly gate CD and variation. This methodology can conveniently capture poly gate CD statistical variation at both intra field and inter field level. The paper shows that this tilo measurement is very useful in guiding poly process debugging and yield improvement work.
Keywords :
built-in self test; delay circuits; elemental semiconductors; field programmable gate arrays; integrated circuit measurement; integrated circuit yield; silicon; statistical analysis; BIST pattern; FPGA circuit; Si; delay; intra field level; methodology; poly gate CD measurement; poly gate CD statistical variation; poly process debugging; product performance; yield improvement; yield process technology; Built-in self-test; Delay; Electric variables measurement; Field programmable gate arrays; Integrated circuit interconnections; Lenses; Programmable logic arrays; Random access memory; Ring oscillators; Scanning electron microscopy;
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
Print_ISBN :
0-7803-7894-6
DOI :
10.1109/ISSM.2003.1243278
