DocumentCode
2265750
Title
A decision support system of real time dispatching in semiconductor wafer fabrication with shortest process time in wet bench
Author
Wang, H.L.
fYear
2003
fDate
30 Sept.-2 Oct. 2003
Firstpage
301
Lastpage
303
Abstract
This paper proposes a new dynamic dispatching algorithm for determining the priority of lots, which are waiting to be processed in wet bench. In MXIC, we have successfully implemented a Real Time Dispatcher (RTD) consisting of our MES (since 1998), which could pass the real time information to on-line operators. However, we didn´t have a proper and good dispatching rule for wet bench since then. We always relied on the veterans´ experience to arrange all the lots run through wet etch. It´s hard to exactly control when and how much lots would come out from wet bench in order to meet the production of furnaces that we want. After applying the new dispatching algorithm in FAB, we found that it turned up the good results of reducing the differences between the seniors´ and juniors´ experience and minimizing the needed time of the specific lots.
Keywords
decision support systems; dispatching; etching; production management; real-time systems; semiconductor device manufacture; decision support system; dynamic dispatching algorithm; furnaces; on-line operation; process time; real time dispatching; real time information; semiconductor wafer fabrication; wet bench; Condition monitoring; Decision support systems; Dispatching; Fabrication; Furnaces; Neck; Production; Productivity; Real time systems; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN
1523-553X
Print_ISBN
0-7803-7894-6
Type
conf
DOI
10.1109/ISSM.2003.1243287
Filename
1243287
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