DocumentCode :
2265750
Title :
A decision support system of real time dispatching in semiconductor wafer fabrication with shortest process time in wet bench
Author :
Wang, H.L.
fYear :
2003
fDate :
30 Sept.-2 Oct. 2003
Firstpage :
301
Lastpage :
303
Abstract :
This paper proposes a new dynamic dispatching algorithm for determining the priority of lots, which are waiting to be processed in wet bench. In MXIC, we have successfully implemented a Real Time Dispatcher (RTD) consisting of our MES (since 1998), which could pass the real time information to on-line operators. However, we didn´t have a proper and good dispatching rule for wet bench since then. We always relied on the veterans´ experience to arrange all the lots run through wet etch. It´s hard to exactly control when and how much lots would come out from wet bench in order to meet the production of furnaces that we want. After applying the new dispatching algorithm in FAB, we found that it turned up the good results of reducing the differences between the seniors´ and juniors´ experience and minimizing the needed time of the specific lots.
Keywords :
decision support systems; dispatching; etching; production management; real-time systems; semiconductor device manufacture; decision support system; dynamic dispatching algorithm; furnaces; on-line operation; process time; real time dispatching; real time information; semiconductor wafer fabrication; wet bench; Condition monitoring; Decision support systems; Dispatching; Fabrication; Furnaces; Neck; Production; Productivity; Real time systems; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN :
1523-553X
Print_ISBN :
0-7803-7894-6
Type :
conf
DOI :
10.1109/ISSM.2003.1243287
Filename :
1243287
Link To Document :
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