Robust sensing-a technique for controlling a semiconductor device production process

This paper proposes the technique for increasing the robustness of fault detection by correctly detecting equipment faults based on a single indicator that is obtained from multiple signals instead of a single signal. The unstable conditions of the plasma CVD system can be monitored more accurately by detecting faults using a single indicator obtained from multiple signals rather than by detecting them using a single signal. In this paper, we demonstrated that robust sensing can be effective, for the fault detection and classification(FDC) method in the wafer production process, if a control model is used which is capable of detecting equipment conditions based on multiple factors.